Groove structure employed for printing film formation and manufacture method thereof
US10243155B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2016 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Jan 27, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
The present invention provides a groove structure employed for printing film formation, wherein the groove structure is located on a substrate, comprises a dam and a groove formed by the dam surrounding, and the dam comprises at least two layers of branch dam layers, which are stacked up, and material of the branch dam layers is silicon nitride or silicon oxide, and material of a top side branch dam layer is silicon oxide, wherein the inclined circumferential surface of the groove, which is surrounded by the branch dam layer manufactured with silicon oxide and the upper surface of the top side branch dam layer are hydrophobic surfaces, and an inclined circumferential surface of the groove, which is surrounded by the branch dam layer manufactured with silicon nitride, is a hydrophilic surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.