In situ cleaning system
US10246666B2 · kind B2 · utility
1Cited by
37References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2016 |
| Grant date | Apr 2, 2019 |
| Priority date | — |
| Expiry date | Dec 8, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2201/4618
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
Methods for using in situ cleaning systems which reduce water hardness and minimize chemical additives are provided. According to the methods and systems, the methods of using may comprise providing feed water to an in situ cleaning system including water treatment components, oxidizing agent generating components and/or alkalinity generating components, contacting one or more articles with a use solution generated by the in situ cleaning system, and washing the one or more articles in a washing system. In addition to the methods of using, the systems for in situ cleaning are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.