Method for producing an antireflection layer on a silicone surface and optical element

US10247856B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Ulrike Schulz · Jena, DE
• Friedrich Rickelt · Jena, DE
• Peter Munzert · Jena, DE
• Norbert Kaiser · Markt Taschendorf, DE

Key dates

• Filing date: Apr 22, 2015
• Grant date: Apr 2, 2019
• Expiry date: Apr 22, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/32136
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.