Patent · US Active

System and method for ion-selective, field effect transistor on flexible substrate

US10249741B2 · kind B2 · utility

4Cited by
11References
12Claims
0Family size

Inventors

Key dates

Filing dateMay 13, 2015
Grant dateApr 2, 2019
Priority date
Expiry dateAug 4, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/60
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A flexible ion-selective field effect transistor (ISFET) and methods of making the same are disclosed. The methods may comprise: (a) attaching a flexible substrate to a rigid support with an adhesive; (b) forming an ion-selective field effect transistor structure on a surface of the flexible substrate; and (c) removing the flexible substrate from the rigid support after step (b).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.