System and method for ion-selective, field effect transistor on flexible substrate
US10249741B2 · kind B2 · utility
4Cited by
11References
12Claims
0Family size
Inventors
Key dates
| Filing date | May 13, 2015 |
| Grant date | Apr 2, 2019 |
| Priority date | — |
| Expiry date | Aug 4, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A flexible ion-selective field effect transistor (ISFET) and methods of making the same are disclosed. The methods may comprise: (a) attaching a flexible substrate to a rigid support with an adhesive; (b) forming an ion-selective field effect transistor structure on a surface of the flexible substrate; and (c) removing the flexible substrate from the rigid support after step (b).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.