Patent · US Active

Surface doping of nanostructures

US10249808B2 · kind B2 · utility

0Cited by
11References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 1, 2016
Grant dateApr 2, 2019
Priority date
Expiry dateSep 1, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/8603
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

This disclosure provides systems, methods, and apparatus related to surface doping of nanostructures. In one aspect a plurality of nanostructures is fabricated with a solution-based process using a solvent. The plurality of nanostructures comprises a semiconductor. Each of the plurality of nanostructures has a surface with capping species attached to the surface. The plurality of nanostructures is mixed in the solvent with a dopant compound that includes doping species. During the mixing the capping species on the surfaces of the plurality of nanostructures are replaced by the doping species. Charge carriers are transferred between the doping species and the plurality of nanostructures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.