Patent · US Active

Etching of plastic using acidic solutions containing trivalent manganese

US10260000B2 · kind B2 · utility

1Cited by
18References
19Claims
0Family size

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Key dates

Filing dateJan 23, 2012
Grant dateApr 16, 2019
Priority date—
Expiry dateJun 9, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D5/56
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method of preparing a solution capable of etching a platable plastic. The method comprises the steps of: (a) providing an electrolyte comprising a solution of manganese(II) in a solution of 9 to 15 molar sulfuric acid or phosphoric acid to an electrolytic cell; (b) applying a current to the electrolytic cell, wherein the electrolytic cell comprises an anode and a cathode; and (c) oxidizing the electrolyte to form manganese(III) ions, wherein the manganese(III) ions form a metastable sulfate complex. Thereafter, a platable plastic may be immersed in the metastable sulfate complex for a period of time to etch the platable substrate prior to subsequent plating steps.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.