LTPS multilayered structure and method for measuring misalignment in the same structure
US10260872B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 2015 |
| Grant date | Apr 16, 2019 |
| Priority date | — |
| Expiry date | Feb 14, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/30
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present application provides an LTPS multilayered structure, which includes: a first stack layer having a reference pattern structure formed thereon and provided with uniformly distributed first references; and a second stack layer disposed on the first stack layer and having an alignment pattern structure formed thereon and provided with uniformly distributed second references each selectively aligning with one of the first references so that misalignment between the first stack layer and the second stack layer is precisely calculated by markings attached to each of the first references. The present further provides a method for measuring misalignment between a plurality of stack layers in the LTPS multilayered structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.