Arc plasma-generating systems and methods thereof
US10261120B1 · kind B1 · utility
0Cited by
7References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2017 |
| Grant date | Apr 16, 2019 |
| Priority date | — |
| Expiry date | Oct 17, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to systems for generating an arc fault in an electrical circuit, as well as methods thereof. In particular, the system provides a platform that can produce an arc discharge in a controlled manner, while measuring various parameters to characterize that discharge. Such parameters include voltage measurements, current measurements, optical spectroscopy measurements, electron temperatures, and/or plasma temperatures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.