Plasma monitoring device
US10262841B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2017 |
| Grant date | Apr 16, 2019 |
| Priority date | — |
| Expiry date | Jun 10, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B47/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.