Patent · US Active

Nitride semiconductor element and method for manufacturing the same

US10263152B2 · kind B2 · utility

0Cited by
4References
13Claims
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Key dates

Filing dateSep 25, 2017
Grant dateApr 16, 2019
Priority date
Expiry dateSep 25, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/817

Abstract

A nitride semiconductor element includes a sapphire substrate including: a main surface extending in a c-plane of the sapphire substrate, and a plurality of projections disposed at the main surface, the plurality of projections including at least one projection having an elongated shape in a plan view; and a nitride semiconductor layer disposed on the main surface of the sapphire substrate. The at least one projection has an outer edge extending in a longitudinal direction of the elongated shape, the outer edge extending in a direction oriented at an angle in a range of −10° to +10° with respect to an a-plane of the sapphire substrate in the plan view.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.