Device having at least two wafers for detecting electromagnetic radiation and method for producing said device
US10270001B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2013 |
| Grant date | Apr 23, 2019 |
| Priority date | — |
| Expiry date | Oct 31, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/1461
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An arrangement of at least two wafers for detecting electromagnetic radiation, in particular far infrared radiation, comprises a first wafer and a second wafer. The first wafer includes a microsystem formed as a sensor array. The microsystem is configured to register electromagnetic radiation and provide a corresponding sensor signal. The second wafer includes an integrated circuit formed as an evaluation circuit that is coupled to the sensor array. The integrated circuit is configured to detect the electromagnetic radiation with the aid of the sensor signal provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.