Patent · US Active

Method of coating both sides of a substrate using a sacrificial coating

US10273573B2 · kind B2 · utility

1Cited by
64References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 5, 2016
Grant dateApr 30, 2019
Priority date
Expiry dateApr 27, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2218/365
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method of depositing coating onto both sides of a substrate is provided, which includes steps of upwardly sputtering one or more lower targets to deposit a sacrificial coating onto a second surface and downwardly sputtering one or more upper targets to deposit a first functional coating onto a first surface, washing the substrate with one or more washers to remove the sacrificial coating from the second surface while leaving intact the first functional coating on the first surface, and downwardly sputtering the one or more upper targets to deposit a second functional coating onto the second surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.