Self-cleaning film system and article
US10274647B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2017 |
| Grant date | Apr 30, 2019 |
| Priority date | — |
| Expiry date | May 28, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B17/06
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material. The system includes an adhesive layer adhered to the substrate and a release liner affixed to and removable from the adhesive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.