Deposition process based on stencil mask and application to the fabrication of tags supporting multi-functional traceable codes
US10280506B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2015 |
| Grant date | May 7, 2019 |
| Priority date | — |
| Expiry date | Apr 11, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09F3/0376
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical gas phase deposition process comprises steps of providing a high vacuum chamber, and inside the high vacuum chamber: positioning a substrate surface; positioning a mask parallel to the substrate surface, whereby the mask comprises one or more openings; adjusting a gap of determined dimension between the substrate surface and the mask; and orienting a plurality of chemical precursor beams of at least one precursor species towards the mask with line of sight propagation, each of the plurality of chemical precursor beams being emitted from an independent punctual source, and molecules of the chemical precursor pass through the one or more mask openings to impinge onto the substrate surface for deposition thereon. At least a part of the chemical precursor molecules decompose on the substrate surface at a decomposition temperature. The process further comprises adjusting a temperature of the substrate surface greater or equal to the chemical precursor molecule decomposition temperature, thereby remaining greater than a mask temperature, and maintaining the mask temperature below the decomposition temperature, thereby causing a decomposition of the chemical precursor and a gro…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.