Methods of fabricating pillared graphene nanostructures
US10287677B2 · kind B2 · utility
2Cited by
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Key dates
| Filing date | Nov 18, 2013 |
| Grant date | May 14, 2019 |
| Priority date | — |
| Expiry date | Nov 18, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods of fabricating a graphene film are disclosed. An example method can include providing a substrate, heating the substrate between about 600° C. and about 1100° C. in a chamber, and introducing a carbon source into the chamber at a temperature between about 600° C. and about 1100° C. for about 10 seconds to about 1 minute. The method can further include cooling the substrate to about room temperature to form the graphene film Methods of fabricating pillared graphene nano structures and graphene based devices are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.