Substrate with low-permeability coating for the solidification of silicon

US10287703B2 · kind B2 · utility

Assignee

• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Jean-Paul Garandet · Aix-les-Bains, FR
• Denis Camel · Chambéry, FR
• Béatrice Drevet · Grenoble, FR
• Nicolas Eustathopoulos · Grenoble, FR
• Charles Huguet · Paris, FR
• Johann Testard · Annecy, FR
• Rayisa Voytovych · Échirolles, FR

Key dates

• Filing date: Sep 12, 2014
• Grant date: May 14, 2019
• Expiry date: Sep 12, 2034

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C04B2111/00879
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A substrate characterised in that it is at least partially surface-coated with a coating containing at least one so-called “barrier” layer having silica and one or more material(s) X selected from among SiC, Si, Si3N4, in which layer the amount of X varies between 25-wt. % and 50.-wt. % in relation to the total weight of the barrier layer, the barrier layer being formed by grains of one or more materials X covered at least partially in a silica shell, and the barrier layer being in direct contact with the substrate.