Substrate deposition systems
US10288771B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2017 |
| Grant date | May 14, 2019 |
| Priority date | — |
| Expiry date | Oct 11, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C30/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate deposition system includes a system frame; a plurality of processing tanks carried by the system frame, the plurality of processing tanks adapted to contain liquid coating materials of different light refractive indexes; at least one actuator disposed in proximity to the plurality of processing tanks, the at least one actuator adapted to sequentially immerse at least one substrate in the liquid coating materials and transfer the at least one substrate between the plurality of processing tanks; and at least one coating system located in a process flow downstream direction from the plurality of processing tanks, the at least one coating system adapted to apply an antireflective coating to the at least one substrate. A lens surface location measuring system is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.