Method for manufacturing contrast amplifying substrates
US10295822B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 17, 2014 |
| Grant date | May 21, 2019 |
| Priority date | — |
| Expiry date | Apr 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/068
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for producing a contrast-amplifying support comprising an absorbing substrate carrying at least one absorbing layer comprises a design step for the support and the following steps: i) choosing an illumination wavelength λ; ii) choosing a material constituting the substrate and exhibiting, at illumination wavelength λ, a complex refractive index N0=n0−jk0 with k0≥0.01; iii) choosing an ambient medium in contact with the layer on the side opposite to the substrate and exhibiting, at illumination wavelength λ, a complex refractive index N3=n3−jk3 with k3≥0; iv) determining a nominal complex refractive index N1=n1−jk1 and a nominal thickness e1 of the layer wherein it behaves in the guize of antireflection layer when illuminated under normal incidence at illumination wavelength λ; and v) choosing a material constituting the layer and exhibiting, at illumination wavelength λ, a complex refractive index whose real and imaginary parts coincide with the nominal complex refractive index.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.