Plasma generation apparatus, CVD apparatus, and plasma-treated particle generation apparatus
US10297423B2 · kind B2 · utility
2Cited by
12References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2012 |
| Grant date | May 21, 2019 |
| Priority date | — |
| Expiry date | Sep 30, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2406
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses an electrode cell. The electrode cell includes a first electrode, a second electrode facing the first electrode with interposition of a discharge space therebetween, and dielectrics arranged on main surfaces of the electrodes. The plasma generation apparatus further includes a pipe passage configured to directly supply a source gas from the outside of the housing to the discharge space without being connected to a space within the housing where the electrode cell is not arranged.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.