Systems and methods for gas disposal
US10300439B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 28, 2015 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Oct 19, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/40
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for controlling the saturation level of gas in a liquid discharge includes obtaining temperature and pressure measurements of a solvent in a mixing vessel and obtaining a pressure measurement of a source feedstock in a feedstock tank, correlating the temperature and pressure measurements of the solvent to baseline data to generate a theoretical uptake rate for the source feedstock into the solvent and a theoretical flow rate of the source feedstock into the mixing vessel, and determining a required opening setting for a feedstock valve in the feedstock input line in order to achieve a desired liquid displacement in the mixing vessel. The method includes determining an uptake duration and achieving an uptake displacement equivalent to the reverse of the desired liquid displacement. The method includes generating a valve operating control law for how the feedstock valve should function in a cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.