Patent · US Active

Process for obtaining a substrate provided with a coating

US10301712B2 · kind B2 · utility

0Cited by
5References
22Claims
0Family size

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Key dates

Filing dateMay 21, 2014
Grant dateMay 28, 2019
Priority date
Expiry dateJun 24, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2218/328
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A process for obtaining a substrate provided with a coating, in which the coating includes a pattern with spatial modulation of at least one property of the coating, includes performing a heat treatment, using a laser radiation, of a continuous coating deposited on the substrate. The heat treatment is such that the substrate is irradiated with the laser radiation focused on the coating in the form of at least one laser line, keeping the coating continuous and without melting of the coating, and a relative displacement of the substrate and of the laser line focused on the coating is imposed in a direction transverse to the longitudinal direction of the laser line, while temporally modulating during this relative displacement the power of the laser line as a function of the speed of relative displacement and of the dimensions of the pattern in the direction of relative displacement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.