Mask for deposition and manufacturing method thereof
US10301715B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2017 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Aug 4, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D1/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask for deposition and a manufacturing method thereof are disclosed in aspects of the present disclosure. The disclosed mask for deposition and the manufacturing method thereof include: a deposition part including a plurality of deposition patterns; a peripheral part configured to surround the outside of the deposition part; and at least one extending part provided at the boundary between the deposition part and the peripheral part, wherein the extending part has a thickness smaller than that of the peripheral part. Accordingly, it is possible to enhance the strength of the boundary portion between the peripheral part and the deposition part of the mask for deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.