Transparent conductive film and method for producing the same
US10303284B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2015 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Apr 28, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04103
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13×1020 atoms/cm3 or less; and the transparent conductive layer has a specific resistance of 1.1×10−4 Ω·cm or more and 2.8×10−4 Ω·cm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.