Cleaning device for atomizing and spraying liquid in two-phase flow
US10304705B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2016 |
| Grant date | May 28, 2019 |
| Priority date | — |
| Expiry date | Mar 5, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B17/0607
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning device for atomizing and spraying liquid in two-phase flow comprising a nozzle provided with multiple liquid bypass pipelines each having liquid guiding outlets inclined at a predetermined angle and an exhaust mesh plate having vertical gas guiding outlets, which makes the high speed liquid flow and high speed gas flow sprayed out therefrom collide against each other sufficiently to form ultra-micro atomized particles with uniform and adjustable size. The ultra-micro atomized particles are sprayed out downwardly to the wafer surface under the acceleration and vertical orientation effects of an atomized particle guiding outlet to perform a reciprocating cleaning for the wafer. Other components such as an ultrasonic or megasonic generation unit, a gas shielding unit, a self-cleaning unit or a rotating unit can also be provided to perform the multifunction of the nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.