Method and apparatus for continuous removal of water vapors from gases
US10307709B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2017 |
| Grant date | Jun 4, 2019 |
| Priority date | — |
| Expiry date | Mar 3, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC10L2290/541
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for continuously removing water vapor from a carrier gas is disclosed. This method includes, first, causing direct contact of the carrier gas with a liquid mixture in a separation chamber, the carrier gas condensing at a lower temperature than the water vapor. A combination of chemical effects cause the water vapor to condense, complex, or both condense and complex with the liquid mixture. The liquid mixture is chosen from the group consisting of: first, a combination of components that can be maintained in a liquid phase at a temperature below the water vapor's condensation point, whereby the water vapor condenses into the liquid mixture; second, a combination of components where at least one component forms a chemical complex with the water vapor and thereby extracts at least a portion of the water vapor from the carrier gas; and third, a combination of components that can both be maintained in a liquid phase at a temperature below the water vapor's condensation point, and wherein at least one component forms a chemical complex with the water vapor and thereby extracts at least a portion of the water vapor from the carrier gas. The liquid mixture is then reconstituted af…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.