Patent · US Active

Patterned plasmonic underlayer

US10310182B2 · kind B2 · utility

4Cited by

2References

20Claims

0Family size

Assignee

Seagate Technology LLC · US

Inventors

Ganping Ju · Pleasanton, US
Chubing Peng · Eden Prairie, US
Xiaobin Zhu · San Ramon, US
Yingguo Peng · San Ramon, US
Yukiko Kubota · Campbell, US
Timothy J. Klemmer · Fremont, US
Jan-Ulrich Thiele · Sunnyvale, US
Michael Allen Seigler · Eden Prairie, US
Werner Scholz · Duisburg, DE
Kim Y. Lee · Fremont, US
David S. Kuo · Palo Alto, US
Koichi Wago · Sunnyvale, US

Key dates

Filing date	Oct 16, 2013
Grant date	Jun 4, 2019
Priority date	—
Expiry date	May 5, 2037

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.