Photoacid generators and lithographic resists comprising the same
US10310375B2 · kind B2 · utility
2Cited by
40References
9Claims
0Family size
Inventors
Key dates
| Filing date | Mar 19, 2014 |
| Grant date | Jun 4, 2019 |
| Priority date | — |
| Expiry date | Mar 19, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.