Vacuum apparatus for vacuum treating substrate
US10312061B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 28, 2014 |
| Grant date | Jun 4, 2019 |
| Priority date | — |
| Expiry date | Aug 16, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0041
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An embodiment of the present disclosure provides a vacuum apparatus, which relates to a display technical field. The vacuum apparatus can eliminate an electrostatic adsorption between a substrate and an electrode so as to avoid damages to the substrate. The vacuum apparatus includes: a vacuum cavity; a first electrode and a second electrode located inside the vacuum cavity and opposite to each other; and positioning structures for positioning the substrate. The substrate is located between the first electrode and the second electrode and is positioned closer to the first electrode or the second electrode. The vacuum apparatus further includes an electrostatic elimination device. The electrostatic elimination device can eliminate the electrostatic adsorption between the substrate and the first electrode and/or between the substrate and the second electrode by attracting charged particles to the surface of the substrate closer to a side of the first electrode and/or the surface of the substrate closer to a side of the second electrode. The present disclosure also relates to manufacture method of the vacuum apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.