Patent · US Active

Method of producing layer structure, layer structure, and method of forming patterns

US10312074B2 · kind B2 · utility

1Cited by
2References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 16, 2015
Grant dateJun 4, 2019
Priority date
Expiry dateOct 26, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G2261/90
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.