Process for making a self-aligned waveguide
US10312568B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 14, 2017 |
| Grant date | Jun 4, 2019 |
| Priority date | — |
| Expiry date | Dec 14, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01P11/005
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
A process for making a self-aligned waveguide includes: disposing a central conductor layer on a substrate; disposing a mask layer on the central conductor layer; forming a mask from the mask layer; removing a portion of the central conductor layer; forming an undercut interposed between substrate and the mask; forming a central conductor; disposing a ground conductor layer on the mask and the substrate; removing a portion of the ground conductor layer disposed on the mask; forming a ground plane conductor from the ground conductor layer in response to removing the portion of the ground conductor layer; and removing the mask to make the self-aligned waveguide in which the undercut provides self-alignment of each of the inner walls of the ground plane conductor to each of the sidewalls of the central conductor, and the ground plane conductor is electrically isolated from the central conductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.