Method for open-air pulsed laser deposition
US10316403B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Feb 17, 2017 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Feb 17, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/483
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for open-air pulsed laser deposition by providing a target and a substrate, configuring a laser directed to the target, reducing the pressure in the zone between the target and substrate by providing a suction having an opening proximal to the target. Optionally, shielding the zone between the target and substrate from ambient oxygen by flowing an inert gas from outside the zone. The method may accommodate very large substrates and multiple targets and multiple laser beams. The target may be tilted or remotely tilted. Matrix assisted pulsed laser deposition may be utilized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.