Fabrication method of color filter substrate, color filter substrate and display device
US10317587B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 4, 2016 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Aug 3, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/40
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A fabrication method of a color filter substrate, a color filter substrate and a display device are provided. The fabrication method includes forming an interlayer insulating layer and a first color filter group above the conductive pattern, wherein, the first color filter group includes color filter(s) of at least one color, the interlayer insulating layer and the first color filter group are formed by a same material; the interlayer insulating layer is configured to electrically insulate the conductive connecting portion from the conductive bridging portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.