Light-field microscopy with phase masking
US10317597B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2015 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | Jun 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0075
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various aspects of the present disclosure are directed toward optics and imaging. As may be implemented with one or more embodiments, an apparatus includes one or more phase masks that operate with an objective lens and a microlens array to alter a phase characteristic of light travelling in a path from a specimen, through the objective lens and microlens array and to a photosensor array. Using this approach, the specimen can be imaged with spatial resolution characteristics provided via the altered phase characteristic, which can facilitate construction of an image with enhanced resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.