Patterned multi-beam nanoshift lithography for on-the-fly, high throughput production of customizable shape-designed microparticles, nanoparticles, and continuous films

US10317799B2 · kind B2 · utility

Assignee

• The Regents of the University of California · US

Inventors

• Thomas G. Mason · Los Angeles, US
• Kenny Mayoral · Los Angeles, US

Key dates

• Filing date: May 1, 2017
• Grant date: Jun 11, 2019
• Expiry date: May 1, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/201
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A system and a method of producing sub-millimeter scale particles are provided herein. The method includes providing a substrate that has a layer of photosensitive material thereon; exposing a portion of the layer to a structured beam of light that has a cross-sectional shape, and a cross-sectional size. The cross-sectional size of the structured beam of light at the layer of photosensitive material is smaller than a sub-millimeter scale particle. The method also includes moving the substrate or the beam of light relative to each other to follow a path for making additional exposures or continuous exposure to result in a discrete exposed pattern in the layer that corresponds to the particle being produced, and exposing the layer to the light; and processing the layer to remove unexposed material around the discrete exposed pattern and to separate the discrete exposed pattern from the layer to provide the sub-millimeter scale particle.