Semiconductor treatment composition and treatment method
US10319605B2 · kind B2 · utility
1Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 2, 2017 |
| Grant date | Jun 11, 2019 |
| Priority date | — |
| Expiry date | May 2, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.