Thermal chemical vapor deposition process and coated article
US10323321B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2016 |
| Grant date | Jun 18, 2019 |
| Priority date | — |
| Expiry date | Jul 27, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/325
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Thermal chemical vapor deposition processes and coated articles are disclosed. The coated article includes a surface having a surface impurity and a coating on the surface formed by thermally reacting a gas. In comparison to a comparable coating without the surface impurity, the coating on the surface has substantially the same level of adhesion, corrosion resistance over 24 hours in 6M HCl, corrosion resistance over 72 hours in NaClO, and electrochemical impedance spectroscopy results. Additionally or alternatively, the surface impurity has properties that reduce or eliminate adhesion of a comparative coating produced by decomposition of silane on a comparative surface following exposure of the surface to a temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.