Device for measuring an aberration, imaging systems and methods for measuring an aberration

US10324306B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• René Berlich · Jena, DE
• Claudia Reinlein · Jena, DE

Key dates

• Filing date: Jun 23, 2017
• Grant date: Jun 18, 2019
• Expiry date: Jun 23, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J2009/004
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A device for measuring an aberration has an image sensor, projection optics for optically projecting onto the image sensor, an optical unit for influencing the optical projection onto the image sensor so that the result on the image sensor is a multiple image of a plurality of sub-images, wherein the optical unit has at least one region per sub-image, wherein the regions influence different lateral portions of a wavefront incident on the projection optics in different ways, and an evaluator configured to determine information relating to the aberration based on the multiple image.