System and method for generating mask pattern and exposure system
US10324371B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 6, 2016 |
| Grant date | Jun 18, 2019 |
| Priority date | — |
| Expiry date | Oct 6, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides a system for generating a mask pattern, a method for generating a mask pattern, and an exposure system. According to an embodiment of the present disclosure, the system for generating a mask pattern comprises: a mask pattern provision device configured to provide a mask pattern signal via a wired or wireless network; a mask pattern transmission device configured to process the mask pattern signal provided by the mask pattern provision device to generate mask pattern information, and to transmit the generated mask pattern information over a Radio Frequency Identification (RFID) signal; and a mask pattern generation device configured to generate a mask pattern corresponding to the mask pattern information based on the mask pattern information and display the generated mask pattern. The embodiments of the present disclosure allow interaction between the mask pattern provision device and the mask pattern generation device by utilizing IoT technique, such that the mask pattern generation device can display various different mask patterns on an e-ink screen, thereby providing a fast, convenient and low cost exposure scheme.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.