Chambers for microwave plasma generation
US10327321B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 20, 2016 |
| Grant date | Jun 18, 2019 |
| Priority date | — |
| Expiry date | Jul 20, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4622
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A microwave chamber for plasma generation. The microwave chamber comprises a launch structure at a first end of the microwave chamber to accommodate a microwave source for producing microwave energy and a termination section at a second end of the microwave chamber opposite the first end. The termination section is configured to substantially block propagation of the microwave energy from the second end of the chamber. The microwave chamber further comprises an internal wall structure for guiding the microwave energy received within the microwave chamber at the first end toward the second end and defines a cavity. The internal wall structure comprises an impedance matching section intermediate the first end and the second end, and a capacitive loaded section intermediate the impedance matching section and the second end, wherein the capacitive loaded section comprises at least one ridge extending along a longitudinal axis of the chamber. The microwave chamber defines a first opening extending through a first wall of the capacitive loaded section and a second opening extending through a second wall of the capacitive loaded section. The second wall is opposite the first wall. The fir…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.