Patterned accumulation mode capacitive phase shifter

US10330962B1 · kind B1 · utility

Assignee

• Ciena Corporation · US

Inventors

• Nicolás Abadía Calvo · Quebec City, CA
• Luhua Xu · Montréal, CA
• David Patel · Canton, US
• David V. Plant · Montréal, CA
• Mahdi Parvizi · Gatineau, CA
• Naim Ben-Hamida · Ottawa, CA

Key dates

• Filing date: Apr 17, 2018
• Grant date: Jun 25, 2019
• Expiry date: Apr 17, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G02F2203/50
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A semiconductor waveguide device includes a first semiconductor layer having a first surface, wherein the first surface comprises a first protrusion and a second protrusion collectively forming a first trench in the first semiconductor layer, a second semiconductor layer having a second surface opposing the first surface of the first semiconductor layer, and an insulator layer disposed between and in contact with the first surface and the second surface, wherein the first semiconductor layer, the second semiconductor layer, and the insulator layer form a semiconductor waveguide region, and wherein the first trench is configured to confine a mode of light beam propagation in the semiconductor waveguide region.