Method and device to reduce finFET SRAM contact resistance
US10332891B1 · kind B1 · utility
Assignees
Inventor
Key dates
| Filing date | Apr 30, 2018 |
| Grant date | Jun 25, 2019 |
| Priority date | — |
| Expiry date | Apr 30, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/412
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A static random access memory includes a substrate, fins on the substrate and including a first fin for a first pull-up transistor, a second fin for a second pull-up transistor, a third fin for a first pass-gate transistor and a first pull-down transistor, and a fourth fin for a second pass-gate transistor and a second pull-down transistor, dummy fins on the substrate, gate structures on the fins for forming transistors, first and second recesses in the fins on opposite sides of the gate structures, third recesses in the dummy fins, a first epitaxial region in the first recess, a second epitaxial region in the second recess, a third epitaxial region in the third recess, a merged epitaxial region including the third epitaxial region and the first epitaxial region or the third epitaxial region and the second epitaxial region, and a contact member on the merged epitaxial region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.