Substrates having an antireflection layer and methods of forming an antireflection layer
US10333008B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Oct 30, 2014 |
| Grant date | Jun 25, 2019 |
| Priority date | — |
| Expiry date | Feb 13, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the present disclosure provide for methods of making substrates having an antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.