Methods and systems for selecting recipe for defect inspection
US10338002B1 · kind B1 · utility
7Cited by
12References
32Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 20, 2017 |
| Grant date | Jul 2, 2019 |
| Priority date | — |
| Expiry date | Jan 20, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for selecting optical modes suitable for defect inspection are disclosed. A method may include: scanning a full-stack wafer of the particular type utilizing a set of optical modes to obtain a set of full-stack wafer images; and de-processing the full-stack wafer to produce a de-processed wafer based on a location of a potential defect of interest indicated by the set of full-stack wafer images to facilitate selection of optical modes suitable for defect inspection of wafers of the particular type.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.