Patent · US Active

Substrates handling in a deposition system

US10340166B2 · kind B2 · utility

1Cited by
13References
2Claims
0Family size

Inventor

Key dates

Filing dateNov 22, 2015
Grant dateJul 2, 2019
Priority date
Expiry dateJun 3, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K13/0061
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention describe a substrate handling system that exerts no or controllable external forces to hold substrates, does not contact front or back of the substrates, has minimum contact with side edge area of the substrate, can hold one or two substrate to each position, can be positioned in any orientation, and can be easily handled by human or robots. In the case that no deposition materials is desirable on the edge or sides of substrate, a self-aligned mask that can be attached to the substrate carrier is presented.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.