Patent · US Active

Stencil masks for making conformable electromagnetic device structures

US10344377B1 · kind B1 · utility

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1References
16Claims
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Key dates

Filing dateApr 4, 2017
Grant dateJul 9, 2019
Priority date
Expiry dateAug 5, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D5/022
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Methods of forming shaped structures on a surface are provided. The methods utilize 3D stencils in conjunction with depositing material(s) on a surface. The surface can be non-planar. In some exemplary embodiments, a method of forming a shaped structure on a surface includes placing a 3D stencil onto a non-planar surface such that a non-planar facing side of the stencil conformally covers the non-planar surface, and depositing a material onto the non-planar surface over which the 3D stencil is placed. The deposited material becomes the shaped structure that has at least a layer facing the non-planar surface that conforms to such surface. At least the non-planar facing side of the stencil maintains the shape that is congruent with the non-planar surface when no force is applied to both the non-planar facing side and an opposed opposing side of the stencil. Stencils, stencil masks, kits, and other methods are also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.