Patent · US Active

Systems and methods for controlling exhaust flow through dual after treatment device

US10344642B2 · kind B2 · utility

1Cited by
0References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 2, 2017
Grant dateJul 9, 2019
Priority date
Expiry dateDec 1, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/40
  • WIPO fieldEnvironmental technology
  • WIPO sectorChemistry

Abstract

Systems and methods for controlling a valve for directing an exhaust gas stream through an exhaust duct having a first after treatment device and a second after treatment device in an exhaust system. The method includes receiving sensor signals from a sensor coupled to the second after treatment device. The method includes processing the sensor signals to determine a temperature of the second after treatment device, and determining a position for the valve based on whether the temperature exceeds a pre-defined threshold for the temperature of the second after treatment device. The method includes outputting a control signal to move the valve to a first position in which the exhaust gas stream flows through a first portion of the first after treatment device or a second position in which the exhaust gas stream flows through a second portion of the first after treatment device based on the temperature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.