Sensor with metal substrate and dielectric membrane for determining a process variable of a medium
US10345129B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2013 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Jul 12, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/692
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor for determining at least one process variable of a medium, comprising: a metallic substrate which has a recess at least in a first area; a first dielectric layer which is arranged on the metallic substrate at least in the first area, wherein the first dielectric layer forms a membrane; at least one heating structure which is arranged on the first dielectric layer formed as a membrane in the first area, wherein the heating structure heats the medium; at least one temperature sensor element assigned to the first area, which temperature sensor element is arranged so as to be spaced apart from the heating structure on the first dielectric layer and detects the temperature of the medium heated on the heating structure; and at least one protective layer which covers at least the at least one heating structure and the at least one temperature sensor element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.