Method for manufacturing slit electrode, slit electrode, and display panel
US10345658B2 · kind B2 · utility
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3References
13Claims
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Key dates
| Filing date | Dec 10, 2015 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Jul 1, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/123
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure provides a method for manufacturing a slit electrode, the slit electrode, and a display panel. The method includes steps of forming a first photoresist pattern on a passivation layer, the first photoresist pattern being of a shape identical to a slit of the slit electrode, forming a slit electrode pattern on the passivation layer with the first photoresist pattern, the slit electrode pattern being covering with a second photoresist pattern which has a shape identical to the slit electrode; and removing the first photoresist pattern and the second photoresist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.