Patent · US Active

Photolithographic patterning of a cylinder

US10345705B2 · kind B2 · utility

0Cited by

7References

22Claims

0Family size

Assignee

Xerox Corporation · US

Inventors

Karl E. Kurz · Rochester, US
Amir Prizant · Rochester, US
Christopher D. Blair · Webster, US

Key dates

Filing date	Jul 12, 2013
Grant date	Jul 9, 2019
Priority date	—
Expiry date	Jul 23, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03G15/0921
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.