Trench isolation structures and methods for forming the same
US10347524B2 · kind B2 · utility
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1References
19Claims
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Assignee
Inventors
Key dates
| Filing date | Sep 12, 2016 |
| Grant date | Jul 9, 2019 |
| Priority date | — |
| Expiry date | Sep 14, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/743
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A trench isolation structure is provided. The trench isolation structure includes a substrate. A polygonal trench is disposed in the substrate. An insulating material is disposed in the polygonal trench, and a polygon top-side contact structure is disposed in the polygonal trench and surrounded by the insulating material. The polygon top-side contact structure has the same shape as the polygonal trench from a top view. A method for forming the trench isolation structure is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.